Ion implantation in glasses: Mechanical modifications
Implantation into glasses induces surface stresses which affect mechanical properties. These stresses can be conveniently measured by cantilever beam techniques. For fused silica and other simple silicate glasses, the stress for various ions scales with collisional energy deposition. For complex borosilicates, electronic processes are dominant in establishing stress. For fused silica, stress and hardness (and other physical properties) achieve maximum change at about 2 {times} 10{sup 20} keV/cm{sup 3} and then decrease. For fused silica and other silicates, a second critical energy deposition is found at {approximately}10{sup 23} keV/cm{sup 3} above which many properties (including hardness) exhibit changes associated with an extended damage range. Mechanical properties are greatly altered by implant-induced (N,B) compound formation. Crystallization of the implanted layer can also bring about large increases in surface hardness.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- DOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5979236
- Report Number(s):
- SAND-91-1443C; CONF-911109--8; ON: DE92005460
- Country of Publication:
- United States
- Language:
- English
Similar Records
Collisional Energy Deposition Threshold for Extended Damage Depths in Ion-Implanted Silicates
Ion-implantation effects in glasses
Related Subjects
360601 -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
360605* -- Materials-- Radiation Effects
BORON IONS
CHALCOGENIDES
CHARGED PARTICLES
CRYSTALLIZATION
GLASS
HARDNESS
ION IMPLANTATION
IONS
LITHIUM IONS
MECHANICAL PROPERTIES
MINERALS
NITROGEN IONS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
SILICA
SILICON COMPOUNDS
SILICON OXIDES
STRESSES