A miniature x-ray compatible sputtering system for studying in situ high T sub c thin film growth

Journal Article · Tue Jan 01 04:00:00 EST 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.577112· OSTI ID:6002162

Zheng, J Q; Shih, M C; Wang, X K; Williams, S; Dutta, P; Chang, R P.H.; Ketterson, J B ^[1]

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1. Science and Technology Center for Superconductivity and Materials Research Center, Northwestern University, Evanston, Illinois 60208 (US)

We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high {ital T}{sub {ital c}} oxide films. The geometry is compatible with the in-plane and conventional {theta}--2{theta} diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

• OSTI ID: 6002162
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:1; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
ANIONS
CHARGED PARTICLES
COLLISIONS
ELECTROMAGNETIC RADIATION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
HIGH-TC SUPERCONDUCTORS
ION COLLISIONS
IONIZING RADIATIONS
IONS
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
RADIATIONS
SPUTTERING
SUPERCONDUCTORS
X RADIATION