Absence of negative ion effects during on-axis single target sputter depositions of Y-Ba-Cu-O thin films on Si (100)

Journal Article · Mon Jun 18 04:00:00 EDT 1990 · Applied Physics Letters; (USA)

DOI:https://doi.org/10.1063/1.102845· OSTI ID:6884154

Migliuolo, M; Belan, R M; Brewer, J A ^[1]

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1. Kurt J. Lesker Company, 1515 Worthington Avenue, Clairton, Pennsylvania 15025 (US)

Stoichiometric thin films of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} have been deposited on (100) silicon substrates by {ital on}-{ital axis} single target magnetron sputtering. The effect of oxygen resputtering was minimized through the use of much stronger than usual magnetic assemblies in the source. A magnet assembly incorporating NdB and NdFeB magnets produced a magnetic field above the target twice as large as the one produced by a standard SmCo magnet assembly. This allows for the use of lower operating voltages and a better electron racetrack confinement, resulting in little or no oxygen resputtering. We have obtained stoichiometric or near-stoichiometric films on silicon both by dc and rf magnetron techniques at a variety of sputtering pressures and target to substrate distances.

• OSTI ID: 6884154
• Journal Information: Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:25; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
COPPER COMPOUNDS
COPPER OXIDES
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELEMENTS
MAGNETIC FIELDS
MAGNETS
OXIDES
OXYGEN COMPOUNDS
PERMANENT MAGNETS
PHYSICAL PROPERTIES
SEMIMETALS
SILICON
SPUTTERING
STOICHIOMETRY
SUPERCONDUCTIVITY
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
YTTRIUM OXIDES