Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

On-axis sputter deposition of superconducting YBa sub 2 Cu sub 3 O sub 7-. delta. on Si(100)

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.577243· OSTI ID:5563686
; ;  [1]
  1. Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (USA)
Superconducting thin films of YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} have been deposited using radio-frequency diode sputtering from a single composite target. These films were deposited on silicon substrates at substrate temperatures up to 600 {degree}C using a 90% argon and 10% oxygen sputtering gas mixture. Yttria-stabilized ZrO{sub 2} buffer layers were employed both for electrical isolation and to minimize the reaction between the silicon and the superconductor. The composition and electrical properties of these films, which were deposited on axis from 5 cm targets, were approximately constant over most of the 5 cm substrates and were reproducible. The effect of the sputtering gas pressure, target composition, and substrate temperature on the film composition have been studied. The films deposited on {ital in} {ital situ} heated substrates had {ital T}{sub {ital c}zero}=87 K with 10% to 90% transition widths of less than 5 K and were {ital c}-axis oriented. Films deposited on unheated substrates required processing at higher temperatures, displayed slightly lower resistive transitions (84 K), and were randomly oriented.
OSTI ID:
5563686
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:4; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English