Large area uniform deposition of YBa{sub 2}Cu{sub 3}O{sub 7} thin films by a 90{degree} off-axis sputtering technique

Book · Fri Nov 01 00:00:00 EST 1996

OSTI ID:392192

Rao, R A; Gan, Q; Eom, C B ^[1]

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1. Duke Univ., Durham, NC (United States). Dept. of Mechanical Engineering and Materials Science

Large area uniform deposition of YBa{sub 2}Cu{sub 3}O{sub 7} (YBCO) thin films on 8 inch diameter wafers, using a 3 inch diameter sputtering target and optimized substrate rotation in a single target 90{degree} off-axis sputtering technique, is reported. The variation in thickness, composition and superconducting properties was studied as a function of substrate position on stationary and rotating substrates. The films deposited from a 3 in. target on rotating substrates displayed uniform thickness (<{+-}5% variation) and composition (<2.3% deviation from target stoichiometry) and a consistently high transition temperature ({Tc} > 88.3 K) over an 8 in. diameter area.

• OSTI ID: 392192
• Report Number(s): CONF-951155-; ISBN 1-55899-304-5; TRN: 96:028539
• Resource Relation: Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
YTTRIUM OXIDES
SPUTTERING
SUPERCONDUCTIVITY
BARIUM OXIDES
COPPER OXIDES
ELECTRONIC EQUIPMENT
MATERIALS
SUBSTRATES
SILICON
MAGNETRONS
COMPUTERIZED SIMULATION
CHEMICAL COMPOSITION
RUTHERFORD SCATTERING
STOICHIOMETRY
TRANSITION TEMPERATURE
EXPERIMENTAL DATA