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Patterned YBa sub 2 Cu sub 3 O sub 7 minus x thin films from photopolymerizable precursors

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104206· OSTI ID:6001142
;  [1]
  1. Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650 (US)
A technique which combines the fabrication and patterning of thin films of the high {ital T}{sub {ital c}} superconductor YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} has been developed. The technique possesses the essential features of the metalorganic decomposition method with the additional attribute that the metalorganic precursor is photopolymerizable. Patterns are generated directly in the precursor film using optical exposure through a mask followed by development in a solvent. A subsequent thermal treatment transforms the patterned precursor film to the oriented superconducting phase with {ital c} axis perpendicular to the substrate surface. Resistivity measurements for such a patterned film on a single crystal (100)MgO substrate show an onset to the superconducting state occurring at 85 K with zero resistivity below 67 K.
OSTI ID:
6001142
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 57:27; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English