Silicide Formation in High-Dose Fe-Implanted Silicon

Tan, Z.; Namavar, F.; Heald, S. M.; Budnick, J. I.; Sanchez, F. H.

doi:10.1557/proc-235-267

Silicide Formation in High-Dose Fe-Implanted Silicon

Conference · Sun Dec 01 23:00:00 EST 1991 · Materials Research Society Symposia Proceedings

DOI:https://doi.org/10.1557/proc-235-267· OSTI ID:5997501

Tan, Z. ^[1]; Namavar, F. ^[2]; Heald, S. M. ^[1]; Budnick, J. I. ^[1]; Sanchez, F. H. ^[3]

Brookhaven National Laboratory (BNL), Upton, NY (United States)
Spire Corporation, Bedford, MA (United States)
University of Connecticut, Storrs, CT (United States)

We have studied the silicide formation in Fe-implanted Si(100), with 1×10¹⁷-1×10¹⁸ Fe/cm², using extended x-ray-absorption fine structure (EXAFS), x-ray diffraction and Rutherford backscattering spectrometry (RBS) methods. In the samples as-implanted at 350 °C, no silicide was observed at doses below 3×10¹⁷ Fe/cm². At 5×10¹⁷ Fe/cm², both α-FeSi₂ and (β-FeSi₂ form but 6h-FeSi₂ appears to be the majority phase. As the dose increases to 710¹⁷ and above, ordered FeSi forms, but implantation damage is severe and a large number of Fe atoms are in very disordered environments. In addition to FeSi, Fe₅Si₃ was also observed in the 1×10¹⁸ Fe/cm² sample. Upon post-implantation annealing at 700 °C or 900 °C, single phase β-FeSi₂ was obtained independent of the dosage.

Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC02-76CH00016; FG02-90ER45424; AS05-80ER10742

OSTI ID:: 5997501

Report Number(s):: BNL-46352; CONF-911202--23; ON: DE92005376

Journal Information:: Materials Research Society Symposia Proceedings, Journal Name: Materials Research Society Symposia Proceedings Vol. 235; ISSN 0272-9172

Publisher:: Springer Nature

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360605 -- Materials-- Radiation Effects
665300* -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHARGED PARTICLES
COHERENT SCATTERING
DIFFRACTION
ELEMENTS
ION IMPLANTATION
IONS
IRON IONS
SCATTERING
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SPECTRA
SYNTHESIS
X-RAY DIFFRACTION
X-RAY SPECTRA

Silicide Formation in High-Dose Fe-Implanted Silicon

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References (12)

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