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Silicide structural evolution in high-dose cobalt-implanted Si(100) crystals

Journal Article · · Physical Review (Section) B: Condensed Matter; (USA)
; ;  [1];  [2]; ;  [3]
  1. Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269-3046 (US)
  2. Laboratoire pour l'Utilisation du Rayonnement Electromagnetique, Batiment 209D, 91405 Orsay CEDEX, France
  3. Department of Physics and Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269-3046
The silicide structure in high-dose ((1--8){times}10{sup 17} Co/cm{sup 2}) cobalt-implanted Si(100) crystals is studied by extended x-ray-absorption fine structure, x-ray diffraction, and Rutherford backscattering spectrometry. As the implant dose increases we observe silicide structural evolution from a locally ordered CoSi{sub 2} at a dose of 1{times}10{sup 17} Co/cm{sup 2}, to long-range-ordered CoSi{sub 2} and CoSi at 3{times}10{sup 17} Co/cm{sup 2}, and to a short-range-ordered and highly defective CoSi-like structure at 8{times}10{sup 17} Co/cm{sup 2}. We propose a model in which Co atoms preferentially occupy the interstitial site, first in silicon then in CoSi{sub 2}, to understand the silicide-formation mechanism in the implanted system. The short-range-ordered silicides, observed for the first time, and the structural evolution are discussed in terms of both the CoSi{sub 2} and CoSi structures and the proposed model. Single-phase and strongly oriented CoSi{sub 2} are obtained in samples annealed at 700 {degree}C.
OSTI ID:
5574114
Journal Information:
Physical Review (Section) B: Condensed Matter; (USA), Journal Name: Physical Review (Section) B: Condensed Matter; (USA) Vol. 39:9; ISSN PRBMD; ISSN 0163-1829
Country of Publication:
United States
Language:
English