Precision etching technology

Journal Article · Sun Dec 31 23:00:00 EST 1989 · Oak Ridge National Laboratory Review; (USA)

OSTI ID:5982215

ORNL has developed technology that would enable US manufacturers to produce better semiconductor chips for the electronics industry. The technology involves precision etching techniques using plasma (ionized gas) to fabricate high-density semiconductor chips.

• OSTI ID: 5982215
• Journal Information: Oak Ridge National Laboratory Review; (USA), Journal Name: Oak Ridge National Laboratory Review; (USA) Vol. 23:2; ISSN 0048-1262; ISSN ORNRA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ETCHING
NATIONAL ORGANIZATIONS
NORTH AMERICA
ORNL
PLASMA
PRODUCTION
SEMICONDUCTOR DEVICES
SURFACE FINISHING
TECHNOLOGY UTILIZATION
US AEC
US DOE
US ERDA
US ORGANIZATIONS
USA