SEMATECH, energy systems to collaborate on advanced semiconductor technology
Journal Article
·
· Oak Ridge National Laboratory Review; (USA)
OSTI ID:5999852
ORNL will conduct research aimed at developing an advanced etching technology for the production of improved semiconductors for SEMATECH, an industrial consortium formed to regain US leadership in semiconductor manufacturing.
- OSTI ID:
- 5999852
- Journal Information:
- Oak Ridge National Laboratory Review; (USA), Journal Name: Oak Ridge National Laboratory Review; (USA) Vol. 23:1; ISSN ORNRA; ISSN 0048-1262
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
29 ENERGY PLANNING, POLICY, AND ECONOMY
290500* -- Energy Planning & Policy-- Research
Development
Demonstration
& Commercialization
APPROPRIATE TECHNOLOGY
ETCHING
NATIONAL ORGANIZATIONS
ORNL
RESEARCH PROGRAMS
SEMICONDUCTOR DEVICES
SURFACE FINISHING
TECHNOLOGY ASSESSMENT
TECHNOLOGY IMPACTS
US AEC
US DOE
US ERDA
US ORGANIZATIONS
290500* -- Energy Planning & Policy-- Research
Development
Demonstration
& Commercialization
APPROPRIATE TECHNOLOGY
ETCHING
NATIONAL ORGANIZATIONS
ORNL
RESEARCH PROGRAMS
SEMICONDUCTOR DEVICES
SURFACE FINISHING
TECHNOLOGY ASSESSMENT
TECHNOLOGY IMPACTS
US AEC
US DOE
US ERDA
US ORGANIZATIONS