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Growth and impurity-trapping kinetics in sulfur-doped gallium arsenide epitaxy

Journal Article · · Sov. Phys. J. (Engl. Transl.); (United States)
DOI:https://doi.org/10.1007/BF00896689· OSTI ID:5978161
Measurements have been made on the effects of crystallization conditions on the growth rates and electrophysical parameters for sulfur-doped epitaxial gallium arsenide films: gas speed, supersaturation, and deposition temperature. There is a correlation between the impurity concentration and the growth rate. The results are discussed from a model that incorporates interaction between impurity atoms and matrix ones.
Research Organization:
Tomsk Univ. (USSR)
OSTI ID:
5978161
Journal Information:
Sov. Phys. J. (Engl. Transl.); (United States), Journal Name: Sov. Phys. J. (Engl. Transl.); (United States) Vol. 31:1; ISSN SOPJA
Country of Publication:
United States
Language:
English