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Photoluminescence of undoped (100) InP homoepitaxial films grown by molecular beam epitaxy

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.91204· OSTI ID:5957452
A comparative study is given of the photoluminescence properties between undoped (100) InP homoepitaxial MBE and LPE films and bulk crystals. All of the samples show two peaks; one is a near band-edge emission at 1.41 eV with a small shoulder and the other is at about 1.13 eV. It is shown that the MBE films have a near band-edge emission with intensity comparable with the LPE films, and exhibit a smaller amount of deep-level emission than the LPE films and bulk crystals.
Research Organization:
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, Musashino-shi, Tokyo 180, Japan
OSTI ID:
5957452
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 35:7; ISSN APPLA
Country of Publication:
United States
Language:
English