Excimer lasers and optics. SPIE volume 710

Book · Thu Jan 01 00:00:00 EST 1987

OSTI ID:5939724

Luk, T S

This book discusses the following contents: RESEARCH AND DEVELOPMENT. High average power commercial excimer lasers. Inductively stabilized excimer lasers. Characteristics of an e-beam pumped KrF laser system. Large excimer lasers for fusion. High power picosecond KrF laser system. MATERIAL PROCESSING. Fundamental aspects of pulsed-laser irradiation of semiconductors. Advances in excimer laser lithography. Laser photochemical vapor deposition. Studies of excimer laser etching mechanism using laser-induced fluorescence measurements. Industrial applications of excimer lasers. Excimer laser processing of semiconductor devices: high efficiency solar cells. RESEARCH AND DEVELOPMENT II. Review of UV laser damage measurements at Lawrence Livermore National Laboratory. Generation of subnanosecond excimer laser pulses by means of stimulated Brillouin scattering in liquids. Amplification in a XeCl excimer gain module of 200-fsec UV pulses derived from a colliding pulse mode-locked (CPM) laser system. High order multiphoton processes observed with subpicosecond excimer lasers. VUV fluorescence and harmonic generation with intense picosecond 248 nm KrF radiation. Excited state excimer spectroscopy. Multi-kilojoule narrowband XeCl laser. Performance and properties of e-beam pumped XeF(C ..-->.. A) lasers. Long-pulse e-beam pumped excimer laser.

• OSTI ID: 5939724
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
36 MATERIALS SCIENCE
EXCIMER LASERS
LEADING ABSTRACT
OPTICS
REVIEWS
SEMICONDUCTOR MATERIALS
LASER BEAM MACHINING
FABRICATION
PULSES
RESEARCH PROGRAMS
ABSTRACTS
DOCUMENT TYPES
GAS LASERS
LASERS
MACHINING
MATERIALS
420300* - Engineering- Lasers- (-1989)
360601 - Other Materials- Preparation & Manufacture