Excimer lasers and optics; Proceedings of the Meeting, Cambridge, MA, Sept. 18, 19, 1986
Papers are presented on high average power commercial excimer lasers, inductively stabilized excimer lasers, large excimer lasers for fusion, and advances in excimer laser lithography. Also considered are laser photochemical vapor deposition, an excimer laser etching mechanism using laser-induced fluorescence measurements, the generation of subnanosecond excimer laser pulses by means of stimulated Brillouin scattering in liquids, and excited state excimer spectroscopy. Other topics include amplification in a XeCl excimer gain module of 200-fsec UV pulses derived from a colliding pulse mode-locked laser system, a multikilojoule narrowband XeCl laser, a long-pulse e-beam pumped excimer laser, and high order multiphoton processes observed with subpicosecond excimer lasers.
- OSTI ID:
- 5415568
- Report Number(s):
- CONF-8609408-
- Country of Publication:
- United States
- Language:
- English
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420300* -- Engineering-- Lasers-- (-1989)
DIRECT ENERGY CONVERTERS
EQUIPMENT
EXCIMER LASERS
FREQUENCY MIXING
GAS LASERS
HARMONIC GENERATION
INDUSTRIAL PLANTS
KRYPTON FLUORIDE LASERS
LASER SPECTROSCOPY
LASERS
MATERIALS
MEETINGS
MODE LOCKING
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PULSES
RESEARCH PROGRAMS
SEMICONDUCTOR MATERIALS
SOLAR CELLS
SOLAR EQUIPMENT
SPECTROSCOPY
USES