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Cross-sectional transmission electron microscopy observation of Nb/AlO sub x -Al/Nb Josephson junctions

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104556· OSTI ID:5934196
;  [1]
  1. Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi 243-01, Japan (JP)

A study of microstructure of Nb/AlO{sub {ital x}}-Al/Nb Josephson junctions by cross-sectional transmission electron microscopy yielded much information regarding the junction barrier region. Both thick Nb and several-nanometer Al form polycrystalline films with columnar structures. Nb is oriented to the (110) plane, and Al is (111). The 200 nm lower Nb has a wavy surface with {similar to}5 nm smoothness, but its surface is planarized by several nanometers Al deposited on it. Thus AlO{sub {ital x}} with a smoothness under 1 nm can be formed on Al. The upper Nb has a good crystalline structure even just above the AlO{sub {ital x}} barrier.

OSTI ID:
5934196
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 58:6; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English