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In-situ sputtering of YBCO films for microwave applications

Conference · · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:5932010
 [1]; ;  [2]
  1. CVC Products, Inc., Rochester, NY (US)
  2. Rochester Univ., NY (United States). Dept. of Electrical Engineering

The authors of this paper used rf magnetron sputtering from a single YBCO target onto a heated substrate ({approx}700{degrees} C) to obtain c-axis oriented 1-2-3 films that are superconducting without a subsequent annealing or oxygenation step, with T{sub c}(R = O) as high as 88 K on MgO and LaAlO{sub 3} substrates. This process uses an 8-inch diameter target in the sputter-up configuration, with a central grounded shield to eliminate negative ion bombardment. It can reproducibly and uniformly cover substrates as large as 3 inches across, at rates exceeding 1 {Angstrom}/s. Maintaining film composition very close to stoichiometry is essential for obtaining films with good superconducting properties and surface morphology. Optimum films have critical currents {approx}1 MA/cm{sup 2} at 77 K. Measurements of microwave surface resistance based on a stripline resonator indicate low surface resistance for unpatterned YBCO ground planes, but excess loss and a strong power dependence in a patterned center strip.

OSTI ID:
5932010
Report Number(s):
CONF-900944--
Journal Information:
IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) Vol. 27:2; ISSN IEMGA; ISSN 0018-9464
Country of Publication:
United States
Language:
English

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