Continuous room-temperature multiple-quantum-well Al/sub x/Ga/sub 1-x/As-GaAs injection lasers grown by metalorganic chemical vapor deposition
Journal Article
·
· Appl. Phys. Lett.; (United States)
Room-temperature (approx.26 /sup 0/C) continous operation of Al/sub x/Ga/sub 1-x/As-GaAs multiple-quantum-well injection lasers has been achieved. These devices are grown by metalorganic chemical vapor deposition and employ active regions consisting of six GaAs quantum wells having a thickness L/sub z/approx.120 A separated by five Al/sub 0.30/Ga/sub 0.70/As barriers also approx.120 A thick. These laser diodes operate on LO-phonon-assisted confined-particle transitions and exhibit low threshold current densities (J/sub th/approx.1660 A/cm/sup 2/) and high total external differential quantum efficiencies (eta/sub ext/approx.85%).
- Research Organization:
- Rockwell International, Electronic Devices Division, Electronics Research Center, Anaheim, California 92803
- OSTI ID:
- 5886948
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 35:7; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Low-temperature operation of multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs p-n heterostructure lasers grown by metalorganic chemical vapor deposition. [4. 2 to 77/sup 0/K]
Journal Article
·
Wed Feb 14 23:00:00 EST 1979
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6484069
700-h continuous room-temperature operation of Al/sub x/Ga/sub 1-x/As-GaAs heterostructure lasers grown by metalorganic chemical vapor deposition
Journal Article
·
Wed Aug 15 00:00:00 EDT 1979
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6387568
Low-temperature operation of multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs p-n heterostructure lasers grown by metalorganic chemical vapor deposition. [4. 2 to 77/sup 0/K]
Journal Article
·
Sat Sep 01 00:00:00 EDT 1979
· J. Appl. Phys.; (United States)
·
OSTI ID:6102561
Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL GROWTH
CURRENT DENSITY
DEPOSITION
DIMENSIONS
EFFICIENCY
ELEMENTS
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
MEDIUM TEMPERATURE
METALS
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SURFACE COATING
THICKNESS
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL GROWTH
CURRENT DENSITY
DEPOSITION
DIMENSIONS
EFFICIENCY
ELEMENTS
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
MEDIUM TEMPERATURE
METALS
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SURFACE COATING
THICKNESS