Effect of added hydrogen on the rf discharge chemistry of CF/sub 4/, CF/sub 3/H, and C/sub 2/F/sub 6/
The products of 50-W 0.5 Torr rf discharges of CF/sub 4/, CF/sub 3/H, C/sub 2/F/sub 6/, and mixtures of these gases with H/sub 2/ were investigated as a function of mass-flow rate (5--80 STD cm/sup 3//min) or H/sub 2/ concentration. In addition, the C/sub 2/F/sub 6/ discharge was studied as a function of pressure (0.2--0.8 Torr) and power (50--200 W). Products from the CF/sub 4/ discharge included F, F/sub 2/, and C/sub 2/F/sub 6/; from CF/sub 3/H: HF, CF/sub 4/, C/sub 2/F/sub 4/, C/sub 2/F/sub 6/, C/sub 2/HF and C/sub 2/H/sub 2/ were produced; from C/sub 2/F/sub 6/: essentially CF/sub 4/ and C/sub 2/F/sub 4/. The addition of H/sub 2/ to CF/sub 4/ or C/sub 2/F/sub 6/ gave the same products as those from CF/sub 3/H. The product distribution was a function of H/sub 2/ concentration. The extent of conversion of starting material was a monotonic function of the residence time in the discharge zone. A mechanistic rationalization follows: CF/sub 4//sup e/-/sub arrow-right-left/F +CF/sub 3//sup e/-/sub arrow-right-left/F+CF/sub 2//sup e/-/sub arrow-right-left/F+CF. The various radicals formed underwent abstraction and recombination reactions. Addition of hydrogen altered the above equilibria as well as the nature of the discharge.
- Research Organization:
- Bell Laboratories, Murray Hill, New Jersey 07974
- OSTI ID:
- 5885195
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 50:11; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
Molecular & Chemical Physics-- Collision Phenomena
74 ATOMIC AND MOLECULAR PHYSICS
CARBON COMPOUNDS
CARBON FLUORIDES
CHEMISTRY
CRYOGENIC FLUIDS
DATA
DISPERSIONS
ELECTRIC DISCHARGES
ELEMENTS
FLOW RATE
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HYDROGEN
INFORMATION
ISOTOPE SEPARATION
MATHEMATICAL MODELS
MEDIUM VACUUM
MIXTURES
NONMETALS
PRESSURE DEPENDENCE
QUANTITY RATIO
SEPARATION PROCESSES