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U.S. Department of Energy
Office of Scientific and Technical Information

Effect of bias on thermally stimulated current (TSC) in irradiated MOS devices

Conference ·
OSTI ID:5881885

TSC measurements at varying bias provide significant insight into the density, energy distribution, and location of MOS oxide-trap charge. Under proper'' bias conditions, TSC and C-V estimates of oxide-trap charge density agree well. 14 refs., 8 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
Sponsoring Organization:
DOE; USDOE, Washington, DC (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5881885
Report Number(s):
SAND-91-0421C; CONF-910751--3; ON: DE91008179
Country of Publication:
United States
Language:
English