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Effect on bias on thermally stimulated current (TSC) in irradiated MOS devices

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/23.124076· OSTI ID:5707978
;  [1];  [2]
  1. Sandia National Labs., Albuquerque, NM (United States)
  2. Diversus, Inc., Albuquerque, NM (United States)

The authors have investigated the electric-field dependence of thermally stimulated current (TSC) in irradiated MOS capacitors for TSC fields ranging from {minus}3 MV/cm to +2 MV/cm. TSC measurements at negative bias following positive-bias irradiation provide useful estimates of the net oxide-trap charge, {Delta}Q{sub ot}, if the TSC bias is large enough to overcome trapped-hole space-charge effects. Very little TSC is observed for positive-bias TSC following positive-bias irradiation. Under proper TSC bias conditions, TSC and C-V estimates of {Delta}Q{sub ot} agree well for thick, soft oxides, but differ significantly for thin, hard oxides. Differences between TSC and C-V estimates of {Delta}Q{sub ot} for thin, hard oxides are attributed to electron injection into the oxide and capture at trap sites associated with the radiation-induced trapped holes. This paper shows that TSC measurements can provide insight into the location of hole traps in MOS oxides that cannot be obtained from standard C-V tests.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
5707978
Report Number(s):
CONF-910751--
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 38:6; ISSN 0018-9499; ISSN IETNA
Country of Publication:
United States
Language:
English