Correlation between the ion bombardment during film growth of Pd films and their structural and electrical properties

Journal Article · Fri Apr 01 04:00:00 EST 1983 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.571920· OSTI ID:5866287

Ziemann, P; Kay, E

Pd films were produced in a long mean free path dc triode system using Kr as sputter gas ( p/sub Kr/ = 1 mTorr) and with simultaneous ion bombardment of the growing Pd film. The resulting film properties are related to the energy E/sub n/ delivered by the bombarding Kr ions to the growing film per arriving sputtered Pd atom. Systematic changes of the Kr concentration, the lattice parameter, strain, grain size, preferential orientation, and residual resistivity are observed as a function of E/sub n/. Analysis of the data suggests that, in addition to a possible direct influence of the incorporated Kr, defects produced by the ion bombardment are causing these property changes. This is confirmed by preliminary TEM results revealing a high density of dislocations.

• Research Organization: IBM Research Laboratory, San Jose, California 95193
• OSTI ID: 5866287
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 1:2; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360106* -- Metals & Alloys-- Radiation Effects
640301 -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CHARGED PARTICLES
COLLISIONS
CORRELATIONS
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
DEPOSITION
DISLOCATIONS
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELEMENTS
FILMS
GRAIN SIZE
IONS
KRYPTON IONS
LATTICE PARAMETERS
LINE DEFECTS
METALS
MICROSTRUCTURE
PALLADIUM
PHYSICAL PROPERTIES
PHYSICAL RADIATION EFFECTS
PLATINUM METALS
RADIATION EFFECTS
SIZE
SPUTTERING
TRANSITION ELEMENTS