Magnetron sputter deposition of boron and boron carbide

Conference · Wed Mar 13 00:00:00 EST 1991

OSTI ID:5845602

McKernan, M A; Makowiecki, D; Ramsey, P; Jankowski, A

The fabrication of x-ray optical coatings with greater reflectivity required the development of sputter deposition processes for boron and boron carbide. The use of high density boron and boron carbide and a vacuum brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. The results include a description of the target fabrication procedures and sputter process parameters necessary to fabricate B{sub 4}C{sup (1)} and B{sup (2)} modulated thin film structures. 3 refs., 6 figs.

• Research Organization: Lawrence Livermore National Lab., CA (USA)
• Sponsoring Organization: USDOE; USDOE, Washington, DC (USA)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5845602
• Report Number(s): UCRL-JC-106571; CONF-9104231-1; ON: DE91011194
• Resource Relation: Conference: International conference on metallurgical coatings and thin films (ICMCTF), Waldorf, MD (USA), 22-26 Apr 1991
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BORON
PHYSICAL VAPOR DEPOSITION
BORON CARBIDES
AMBIENT TEMPERATURE
AMORPHOUS STATE
DESIGN
FABRICATION
FRACTURES
PERFORMANCE
SPUTTERING
SUBSTRATES
TARGETS
USES
VAPOR DEPOSITED COATINGS
BORON COMPOUNDS
CARBIDES
CARBON COMPOUNDS
COATINGS
DEPOSITION
ELEMENTS
FAILURES
SEMIMETALS
SURFACE COATING
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture