Magnetron sputter deposition of boron and boron carbide [Book Chapter]

Conference · Tue Mar 12 23:00:00 EST 1991 · Metallurgical Coatings and Thin Films 1991

DOI:https://doi.org/10.1016/b978-0-444-89455-7.50078-2· OSTI ID:5845602

McKernan, Mark A. ^[1]; Makowiecki, D. ^[1]; Ramsey, P. ^[1]; Jankowski, A. ^[1]

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1. Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

The fabrication of x-ray optical coatings with greater reflectivity required the development of sputter deposition processes for boron and boron carbide. The use of high density boron and boron carbide and a vacuum brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. Our results include a description of the target fabrication procedures and sputter process parameters necessary to fabricate B₄C⁽¹⁾ and B⁽²⁾ modulated thin film structures.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5845602
• Report Number(s): UCRL-JC--106571; CONF-9104231--1; ON: DE91011194; ISBN: 978-0-444-89455-7
• Journal Information: Metallurgical Coatings and Thin Films 1991, Journal Name: Metallurgical Coatings and Thin Films 1991
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360601 -- Other Materials-- Preparation & Manufacture
AMBIENT TEMPERATURE
AMORPHOUS STATE
BORON
BORON CARBIDES
BORON COMPOUNDS
CARBIDES
CARBON COMPOUNDS
COATINGS
DEPOSITION
DESIGN
ELEMENTS
FABRICATION
FAILURES
FRACTURES
PERFORMANCE
PHYSICAL VAPOR DEPOSITION
SEMIMETALS
SPUTTERING
SUBSTRATES
SURFACE COATING
TARGETS
USES
VAPOR DEPOSITED COATINGS