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Title: Fabrication of boron sputter targets

Abstract

A process for fabricating high density boron sputtering targets with sufficient mechanical strength to function reliably at typical magnetron sputtering power densities and at normal process parameters. The process involves the fabrication of a high density boron monolithe by hot isostatically compacting high purity (99.9%) boron powder, machining the boron monolithe into the final dimensions, and brazing the finished boron piece to a matching boron carbide (B.sub.4 C) piece, by placing aluminum foil there between and applying pressure and heat in a vacuum. An alternative is the application of aluminum metallization to the back of the boron monolithe by vacuum deposition. Also, a titanium based vacuum braze alloy can be used in place of the aluminum foil.

Inventors:
 [1];  [1]
  1. Livermore, CA
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
869761
Patent Number(s):
US 5392981
Assignee:
Regents Of University Of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
fabrication; boron; sputter; targets; process; fabricating; density; sputtering; sufficient; mechanical; strength; function; reliably; typical; magnetron; power; densities; normal; parameters; involves; monolithe; hot; isostatically; compacting; purity; 99; powder; machining; final; dimensions; brazing; finished; piece; matching; carbide; placing; aluminum; foil; applying; pressure; heat; vacuum; alternative; application; metallization; deposition; titanium; based; braze; alloy; braze alloy; process parameters; magnetron sputter; power densities; hot isostatically; sputtering targets; vacuum deposition; magnetron sputtering; boron carbide; process involves; hot isostatic; mechanical strength; process parameter; applying pressure; boron powder; sputter target; aluminum metal; sputter targets; final dimensions; aluminum foil; boron sputter; /228/204/

Citation Formats

Makowiecki, Daniel M, and McKernan, Mark A. Fabrication of boron sputter targets. United States: N. p., 1995. Web.
Makowiecki, Daniel M, & McKernan, Mark A. Fabrication of boron sputter targets. United States.
Makowiecki, Daniel M, and McKernan, Mark A. Sun . "Fabrication of boron sputter targets". United States. https://www.osti.gov/servlets/purl/869761.
@article{osti_869761,
title = {Fabrication of boron sputter targets},
author = {Makowiecki, Daniel M and McKernan, Mark A},
abstractNote = {A process for fabricating high density boron sputtering targets with sufficient mechanical strength to function reliably at typical magnetron sputtering power densities and at normal process parameters. The process involves the fabrication of a high density boron monolithe by hot isostatically compacting high purity (99.9%) boron powder, machining the boron monolithe into the final dimensions, and brazing the finished boron piece to a matching boron carbide (B.sub.4 C) piece, by placing aluminum foil there between and applying pressure and heat in a vacuum. An alternative is the application of aluminum metallization to the back of the boron monolithe by vacuum deposition. Also, a titanium based vacuum braze alloy can be used in place of the aluminum foil.},
doi = {},
url = {https://www.osti.gov/biblio/869761}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {1}
}

Patent:

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