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Influence of the impurity composition on the formation of recombination centers during irradiation of n-type silicon with high-energy. gamma. rays

Journal Article · · Sov. Phys. - Semicond. (Engl. Transl.); (United States)
OSTI ID:5834722
An analysis of the temperature dependences of the nonequilibrium carrier lifetime tau was used to determine the influence of the impurity composition on the formation of recombination centers during irradiation of n-type silicon (rho=10--500 ..cap omega..xcm) with high-energy (E/sub max/=100 MeV) ..gamma.. rays. The efficiency of formation of the dominant recombination centers and the nature of annealing of the irradiated samples were practically independent of the dopant (phosphorus) concentration and crystal growth method. These results, together with the energy level of the recombination centers (E/sub c/-0.42 eV) and the temperature of their complete annealing (approx.300 /sup 0/C), led to the conclusion that the main recombination centers were divacancies which were components of clusters formed by fast recoil atoms that appeared as a result of photonuclear interactions.
Research Organization:
Scientific-Research Institute of Applied Physics Problems at the V. I. Lenin Belorussian State University, Minsk
OSTI ID:
5834722
Journal Information:
Sov. Phys. - Semicond. (Engl. Transl.); (United States), Journal Name: Sov. Phys. - Semicond. (Engl. Transl.); (United States) Vol. 13:5; ISSN SPSEA
Country of Publication:
United States
Language:
English

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