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GaAs-AlGaAs tunnel junctions for multigap cascade solar cells

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.329940· OSTI ID:5822185
The growth and characterization of tunneling GaAs homojunctions and GaAs-AlGaAs heterojunctions by molecular beam epitaxy for use as optically transparent interconnects in GaAs and AlGaAs solar cells is described. GaAs tunneling interconnects have been achieved with conductances of 300 A/cm/sup 2/-V at 0.050 V, and p-Al/sub x/Ga/sub 1-x/ As/n-GaAs heterojunction structures with x up to 0.4 have been grown which have characteristics comparable to GaAs interconnects. Thin interconnects, 1000 A total thickness, have also been fabricated with conductances comparable to thicker junctions. The effect of dopant diffusion was found to be minimal at the 580 /sup 0/C junction growth temperature, but annealing these tunnel junctions at 650 /sup 0/C for several minutes caused diffusion of about 100 A distance.
Research Organization:
Rockwell International, Microelectronics Research and Development Center, Thousand Oaks, California 91360
OSTI ID:
5822185
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:1; ISSN JAPIA
Country of Publication:
United States
Language:
English