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High laser damage threshold porous silica antireflective coating

Journal Article · · Appl. Opt.; (United States)
DOI:https://doi.org/10.1364/AO.25.001481· OSTI ID:5819103
A quarterwave-thick narrow-bandwidth antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The laser damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.
Research Organization:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94550
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5819103
Journal Information:
Appl. Opt.; (United States), Journal Name: Appl. Opt.; (United States) Vol. 25:9; ISSN APOPA
Country of Publication:
United States
Language:
English