Laser damage in porous-silica antireflection films

Conference · Thu Mar 01 04:00:00 EST 1984

OSTI ID:5106785

Lowdermilk, W H; Wilder, J G; Brown, N J; Gunderson, C A; Milam, D; Rainer, F; Staggs, M C

We used 355-nm, 0.6-ns pulses to measure laser-damage thresholds of porous-silica antireflection coatings deposited from a polymer solution onto fused silica substrates. For 118 coatings with optical thickness of 500 to 600 nm, the median threshold was less than 2 J/cm/sup 2/, and thresholds were not systematically dependent on either the level of filtration of the coating solution or the procedure used to clean the substrates. For coatings 87 to 90 nm in optical thickness, thresholds were as large as 9 J/cm/sup 2/, which is the threshold of the bare polished surfaces of the fused silica substrates. The data suggests that carbon residues from the coating solution are responsible for damage in the thicker coatings.

• Research Organization: Lawrence Livermore National Lab., CA (USA)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5106785
• Report Number(s): UCRL-89863; CONF-8311146-1; ON: DE84009535
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
ANTIREFLECTION COATINGS
CHALCOGENIDES
COATINGS
DAMAGE
HEATING
LASER-RADIATION HEATING
MATERIALS
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PLASMA HEATING
POROUS MATERIALS
SILICA
SILICON COMPOUNDS
SILICON OXIDES