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High damage threshold porous silica antireflective coating

Conference ·
OSTI ID:5679131
; ; ;
A quarterwave-thick, narrow-bandwidth, antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates. 6 refs., 3 figs.
Research Organization:
Lawrence Livermore National Lab., CA (USA)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5679131
Report Number(s):
UCRL-91428; CONF-8410276-2; ON: DE85012924
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ANTIREFLECTION COATINGS
CHALCOGENIDES
COATINGS
ELECTROMAGNETIC RADIATION
HARDENING
LASER RADIATION
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RADIATION HARDENING
RADIATIONS
SILICA
SILICON COMPOUNDS
SILICON OXIDES
TRANSMISSION