Polyimide films from vapor deposition: toward high strength, NIF capsules

Conference · Fri Oct 16 04:00:00 EDT 1998

OSTI ID:5781

Cook, R C ^[1]; Hsieh, E J; Letts, S A; Roberts, C C; Saculla, M

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1. LLNL

The focus of recent efforts at LLNL has been to demonstrate that vapor deposition processing is a suitable technique to form polyimide fnms with sufficient strength for current national ignition facility target specifications. Production of polyimide films with controlled stoichiometry was acccomplished by: 1) depositing a novel co-functional monomer and 2) matching the vapor pressure of each monomer in PMDA/ODA co-depositions. The sublimation and deposition rate for the monomers was determined over a range of temperatures. Polyimide films with thicknesses up to 30 p.m were fabricated. Composition, structure and strength were assessed using FTIR, SEM and biaxial burst testing. The best films had a tensile strength of approximately 100 MPa. A qualitative relationship between the stoichiometry and tensile strength of the film was demonstrated. Thin films ({approximately}3.5 {micro}m) were typically smooth with an rms of 1.5 nm.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• Sponsoring Organization: USDOE Office of Defense Programs (DP)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5781
• Report Number(s): UCRL-JC-132194; DP0211000; ON: DE00005781
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Films
Imides
Laser Targets
Vapor Deposited Coatings