Polyimide films from vapor deposition: Toward high strength, NIF capsules

Journal Article · Mon Mar 01 04:00:00 EST 1999 · Fusion Technology

OSTI ID:328361

Roberts, C C; Letts, S A; Saculla, M D; Hsieh, E J; Cook, R C ^[1]

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1. Lawrence Livermore National Lab., CA (United States)

The focus of recent efforts at LLNL has been to demonstrate that vapor deposition processing is a suitable technique to form polyimide films with sufficient strength for current National Ignition Facility target specifications. Production of polyimide films with controlled stoichiometry was accomplished by: (1) depositing a novel co-functional monomer and (2) matching the vapor pressure of each monomer in PMDA/ODA co-depositions. The sublimation and deposition rate for the monomers was determined over a range of temperatures. Polyimide films with thicknesses up to 30 {micro}m were fabricated. Composition, structure and strength were assessed using FTIR, SEM and biaxial burst testing. The best films had a tensile strength of approximately 100 MPa. A qualitative relationship between the stoichiometry and tensile strength of the film was demonstrated. Thin films ({approximately}3.5 {micro}m) were typically smooth with an rms of 1.5 nm.

• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 328361
• Journal Information: Fusion Technology, Journal Name: Fusion Technology Journal Issue: 2 Vol. 35; ISSN 0748-1896; ISSN FUSTE8
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CHEMICAL VAPOR DEPOSITION
LASER TARGETS
MECHANICAL PROPERTIES
MICROSTRUCTURE
ORGANIC POLYMERS
THERMONUCLEAR FUELS
US NATIONAL IGNITION FACILITY