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Title: Thin film polycrystalline silicon solar cells. Quarterly report No. 2, 1 January 1979-30 March 1979

Technical Report ·
DOI:https://doi.org/10.2172/5779643· OSTI ID:5779643

A composite substrate concept was developed and shear separation successfully demonstrated. This substrate consists of a main molybdenum substrate, a thin (approx. 1 ..mu..m) SiO/sub 2/ barrier layer and a thin (approx. 3000A) Mo layer. The thin Mo layer gets converted to MoSi/sub 2/ and acts as a shear separation layer. This composite substrate shows promise for substantial improvement in recyclability and the quality of silicon ribbons produced. Effects of SiHCl/sub 3/ concentration, total reactant flow rate, beam rf power, substrate temperature and gravity on energy beam deposition were investigated. The deposition efficiency was found to be a strong function of input chlorosilane concentration. Rotating nozzle deposition was also studied. Problems were encountered in the use of the rotating nozzle due to improper impedance matching with the nozzle assembly. This required redesign of the rotating assembly to improve impedance matching. EBD silicon ribbons were grain enhanced by RTR recrystallization and successfully gettered by a two sided phosphorous diffusion which resulted in diffusion lengths ranging up to 75 ..mu..m. Solar cells, 1 x 2 cm in area were fabricated on these silicon ribbons; they exhibited conversion efficiencies of up to 10.1% with a V/sub OC/ of 0.54V, J/sub SC/ of 29.5 mA/cm/sup 2/ and a FF of 63%.

Research Organization:
Motorola, Inc., Phoenix, AZ (USA). Solar Energy Dept.
DOE Contract Number:
ET-78-C-03-2207
OSTI ID:
5779643
Report Number(s):
SAN-2207-T3
Country of Publication:
United States
Language:
English