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Step-edge fabrication of ultrasmall Josephson microbridges

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.91434· OSTI ID:5772111
A technique for producing ultrasmall variable-thickness Josephson microbridges for high-frequency applications is described. A two-dimensional shadowing technique is employed with self-aligning photolithographic and reactive-ion milling processes to pattern the substrate with high-resolution steps. Step heights normal to the substrate are used to determine microbridge dimensions. Lead-alloy microbridges with resistances approx. =10 ..cap omega.. and dimensions of 50 nm have been produced, and their electrical properties studied. The limits on device size are in the range 10--20 nm. Heated-substrate deposition of high-T/sub c/ superconductors is compatible with this technique.
Research Organization:
Becton Center, Department of Engineering and Applied Science, Yale University, New Haven, Connecticut 06520
OSTI ID:
5772111
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 36:3; ISSN APPLA
Country of Publication:
United States
Language:
English