Fabrication of submicron Josephson microbridges using optical projection lithography and liftoff techniques
Conference
·
· AIP Conf. Proc.; (United States)
OSTI ID:5153134
The fabrication of sub-micron, type II microbridges, using a reflected-light microscope for high-resolution, projection photolithography and metal liftoff techniques for precise pattern transfer is described. Microbridges as narrow as 2000 A have been produced. The novel technique of through-the-substrate exposure, which gives extremely sharp edge definition, is discussed, as well as other factors determining resolution and liftoff yield. Experimental results are presented for a 0.2 ..mu..m wide Pb/sub 0.86/In/sub 0.14/ microbridge with a device resistance of 5.5 ..cap omega... Finally, the general applicability of these fabrication techniques is considered.
- Research Organization:
- Yale Univ., New Haven, CT
- OSTI ID:
- 5153134
- Report Number(s):
- CONF-780339-
- Conference Information:
- Journal Name: AIP Conf. Proc.; (United States) Journal Volume: 44
- Country of Publication:
- United States
- Language:
- English
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