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Lattice-matched epitaxial GaInAsSb/GaSb thermophotovoltaic devices

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.53289· OSTI ID:575620
; ; ; ;  [1];  [2]
  1. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-9108 (United States)
  2. Lockheed Martin, Inc., Schenectady, New York 12301 (United States)

The materials development of Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} alloys for lattice-matched thermophotovoltaic (TPV) devices is reported. Epilayers with cutoff wavelength 2{endash}2.4 {mu}m at room temperature and lattice-matched to GaSb substrates were grown by both low-pressure organometallic vapor phase epitaxy and molecular beam epitaxy. These layers exhibit high optical and structural quality. For demonstrating lattice-matched TPV devices, p- and n-type doping studies were performed. Several TPV device structures were investigated, with variations in the base/emitter thicknesses, and some with the incorporation of a high-bandgap GaSb or AlGaAsSb window layer. Significant improvement in the external quantum efficiency and open circuit voltage is observed for devices with an AlGaAsSb window layer compared to those without one. {copyright} {ital 1997 American Institute of Physics.}

Sponsoring Organization:
USDOE
OSTI ID:
575620
Report Number(s):
CONF-9705119--
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 401; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English