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Room temperature deposition of superconducting NbN for superconductor--insulator--superconductor junctions

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.573873· OSTI ID:5755171
Reactive dc magnetron sputtering is used to deposit hard, refractory, superconducting thin films of niobium nitride on amorphous (glass) as well as crystalline (sapphire) substrates held at room temperature. Stoichiometric NbN films so obtained possess the desired B1 crystal structure with a distinct (111) texture, and exhibit high (approx.16 K) superconducting transition temperature. Room temperature deposition of the high T/sub c/ films is achieved primarily by optimizing the reactant fluxes of niobium and nitrogen reaching the substrate, through a systematic study of the nitrogen consumption versus injection characteristics which are found to be an absolute indicator of the quality of NbN formed. Superconductor--insulator--superconductor (SIS) junctions are fabricated by using high T/sub c/ NbN as the base electrode, a thin layer of native oxide grown in oxygen plasma or in room air as the insulator, and vacuum deposited Pb as the counterelectrode. The current versus voltage (I--V) characteristics of the junctions exhibit high (approx.110) nonlinearity parameter and the superconducting gap parameter for NbN, ..delta..approx.2.8 meV. The transition temperature, superconducting gap parameter, and nonlinearity parameter of the junctions are identical for the films deposited at room temperature with predominant (111) texture as well as the films deposited at elevated temperatures possessing (200) texture.
Research Organization:
Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109
OSTI ID:
5755171
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:3; ISSN JVTAD
Country of Publication:
United States
Language:
English