Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

In situ pulsed laser deposition of Nd sub 1. 85 Ce sub 0. 15 CuO sub 4 minus y

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.349691· OSTI ID:5749171
; ; ;  [1];  [2]
  1. Division of Condensed Matter and Radiation Sciences, Naval Research Laboratory, Washington, DC 20375-5000 (US)
  2. Chemistry Division, Research Department, Naval Weapons Center, China Lake, California 93555 (US)
Thin films of the electron-charge-carrying high-temperature superconductor, Nd{sub 1.85}Ce{sub 0.15}CuO{sub 4{minus}{ital y}} have been deposited by pulsed laser deposition on to {l angle}100{r angle} MgO and SrTiO{sub 3} substrates. Film composition, structure, and transport properties were measured as a function of deposition conditions (substrate temperature, oxygen deposition pressure, and postdeposition annealing conditions). {ital C}-axis oriented, single-phase films were formed at high substrate temperatures (900 {degree}C) in high background pressures of oxygen (200 mTorr), but were semiconducting when quenched to room temperature in either oxygen or nitrogen. A reduced oxygen background pressure during deposition at 900 {degree}C resulted in films that were transparent and insulating due to the loss of copper. Films which were deposited at 900 {degree}C ({ital P}{sub oxygen}{ge}200 mTorr) and then slowly cooled in a vacuum were superconducting with a maximum {ital T}{sub {ital c}} (onset) of 15 K and {ital T}{sub {ital c}}({ital R} = 0) of 11 K.
OSTI ID:
5749171
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 70:2; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English