Nb/sub 3/Al/oxide/Pb Josephson tunnel junctions fabricated using a CF/sub 4/ cleaning process

Journal Article · Thu Sep 15 04:00:00 EDT 1983 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.94401· OSTI ID:5748365

Tanabe, K; Katoh, Y; Michikami, O

Nb/sub 3/Al/oxide/Pb Josephson tunnel junctions have been fabricated using a new surface cleaning technique, the CF/sub 4/ cleaning process (CFCP), in which the base electrode is cleaned prior to oxide barrier formation in an Ar and CF/sub 4/, rf plasma mixture. Adopting lower cleaning voltages than for Nb/oxide/Pb junctions, makes it possible to obtain high-quality junctions with very low leakage (V/sub m/ = 30 mV) and uniform Josephson current distribution. Such good junction characteristics indicate the formation of damage-free cleaned electrode surfaces and highly insulating mixed oxide barriers.

• Research Organization: Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, Tokai, Ibaraki 319-11, Japan
• OSTI ID: 5748365
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:6; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALLOYS
ALUMINIUM ALLOYS
ARGON
CARBON COMPOUNDS
CARBON FLUORIDES
CHALCOGENIDES
CLEANING
CURRENTS
DISPERSIONS
DISTRIBUTION
ELECTRIC CURRENTS
ELEMENTS
FABRICATION
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
HALIDES
HALOGEN COMPOUNDS
JOSEPHSON JUNCTIONS
JUNCTIONS
LEAD
METALS
MIXTURES
NIOBIUM ALLOYS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PLASMA
RARE GASES
SUPERCONDUCTING JUNCTIONS
SURFACE CLEANING
SURFACE FINISHING
TUNNEL EFFECT