Reactive ion beam etching of Y-Ba-Cu-O superconductors

Journal Article · Mon Jan 04 04:00:00 EST 1988 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.99321· OSTI ID:5742184

Matsui, S; Takado, N; Tsuge, H; Asakawa, K

It has been found that a reactive ion beam etching (RIBE) using Cl/sub 2/ gas is useful for microfabrication of Y-Ba-Cu-O superconductors. The etching yield enhancement of Y-Ba-Cu-O is observed for Cl/sub 2/ RIBE. The etching yield of Y-Ba-Cu-O at 400 V accelerating voltage, 2 x 10/sup -3/ Torr Cl/sub 2/ pressure for Cl/sub 2/ RIBE is 2, which is twice that for Ar ion beam etching. Y-Ba-Cu-O submicron patterns have been fabricated by focused ion beam lithography and Cl/sub 2/ RIBE. Moreover, a Y-Ba-Cu-O superconducting line with a 4-..mu..m linewidth has been fabricated by annealing an as-sputtered Y-Ba-Cu-O line pattern.

• Research Organization: NEC Corporation, Miyazaki, Kawasaki 213, Japan
• OSTI ID: 5742184
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 52:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
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Cermets
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656100 -- Condensed Matter Physics-- Superconductivity
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALKALINE EARTH METAL COMPOUNDS
ARGON IONS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHARGED PARTICLES
CHLORINE
COLLISIONS
COPPER COMPOUNDS
COPPER OXIDES
ELEMENTS
ETCHING
FABRICATION
FILMS
HALOGENS
ION COLLISIONS
IONS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
SUPERCONDUCTING FILMS
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
YTTRIUM OXIDES