Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

A study of deposited YBaCuO thin films by D. C. magnetron sputtering

Journal Article · · Modern Physics Letters B; (USA)
; ; ; ; ; ;  [1]
  1. Academia Sinica, Hefei, AH (China). Inst. of Plasma Physics
The YBaCuO thin films with critical transition temperature above 77{Kappa} (in their experiments, they are 83{Kappa}) have been prepared successfully. The sintered oxides of Y, Ba and Cu with proper composition was used as target. To control the parameters during sputtering deposition processes is very important to obtain high T/sub c/ thin film. The composition and phase structure were investigated by means of X-fluoroscope, electron-probe and X-ray diffractometer. The second ions spectroscopies of film and bulk sample were investigated using SIMS. It is clear that thin films lost their oxygen more easily under bombardment of Ar/sup +/ with certain energy.
OSTI ID:
5733727
Journal Information:
Modern Physics Letters B; (USA), Journal Name: Modern Physics Letters B; (USA) Vol. 1:9; ISSN MPLBE; ISSN 0217-9849
Country of Publication:
United States
Language:
English

Similar Records

Gallium nitride thin films deposited by radio-frequency magnetron sputtering
Journal Article · Sat Jul 15 00:00:00 EDT 2006 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:20777308

Highly reliable epitaxial YBaCuO thin-films using pressure-controlled magnetron sputtering method
Conference · Thu Feb 28 23:00:00 EST 1991 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:5721160

Microstructural characterization of YBaCuO thin films deposited by rf magnetron sputtering as a function of annealing conditions
Journal Article · Thu Jan 31 23:00:00 EST 1991 · Journal of Materials Research; (USA) · OSTI ID:6259243