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Avalanche buildup time of an InP/InGaAsP/InGaAs APD at high gain

Journal Article · · IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA)
DOI:https://doi.org/10.1109/3.35229· OSTI ID:5732296
;  [1]
  1. Iowa State Univ. of Science and Technology, Ames, IA (USA). Dept. of Electrical Engineering
Under a high-gain operating condition, the presence of a multiplication process in the InGaAs(P) regions of an InP/InGaAsP/InGaAs avalanche photodiode having a structure of separated absorption and multiplication regions (SAM-APD) could lead to significant enhancement of the avalanche buildup time. As a result, the bandwidth of the device could be reduced considerably. The dependence of the avalanche multiplication factor and the intrinsic response time on the reverse bias voltage, the heterointerface field, the doping concentrations, and the width of the InP layer are examined in detail for the case in which hole injection is assumed. It is shown, for example, that for a fixed value of doping concentrations, the reduction of the excess noise factor and the enhancement of the gain-bandwidth product of the device can be made at the same time by a proper increase of the width of the InP layer.
OSTI ID:
5732296
Journal Information:
IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA), Journal Name: IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA) Vol. 25:9; ISSN 0018-9197; ISSN IEJQA
Country of Publication:
United States
Language:
English