Mechanism of thermal electron attachment in O/sub 2/--C/sub 2/H/sub 4/, O/sub 2/--CO/sub 2/, and O/sub 2/--neopentane mixtures

Journal Article · Sat Dec 15 04:00:00 EST 1979 · J. Chem. Phys.; (United States)

OSTI ID:5707616

Kokaku, Y; Hatano, Y; Shimamori, H; Fessenden, R W

Thermal electron attachment of O/sub 2/ in O/sub 2/--C/sub 2/H/sub 4/, O/sub 2/--CO/sub 2/, and O/sub 2/--neopentane mixtures has been investigated at room temperature, using a microwave conductivity technique combined with pulse radiolysis. The measurements have been extended to a higher pressure region (approx.850 Torr) than previous observations in order to compare them with the results of an electron swarm method at very high pressures. From low pressure data, the values of (2.0 +- 0.3) x 10/sup -30/, (3.2 +- 0.3) x 10/sup -30/, and (7 +- 1) x 10/sup -30/ cm/sup 6//molecule/sup 2/ sec are determined for the overall three body attachment rate constants of O/sub 2/ with the stabilizing partners C/sub 2/H/sub 4/, CO/sub 2/, and neopentane, respectively. In each case, the effective rate constant continued to increase with increased density and exceeded those predicted by the Bloch--Bradbury mechanism by sizeable amounts. The excess attachment is suggested to involve pre-existing van der Waals complexes such as (O/sub 2/xC/sub 2/H/sub 4/). Some quantitative conclusions which follow from this mechanism are given.

• Research Organization: Department of Chemistry, Tokyo Institute of Technology, Meguro-ku, Tokyo 152, Japan
• OSTI ID: 5707616
• Journal Information: J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 71:12; ISSN JCPSA
• Country of Publication: United States
• Language: English

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38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
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CARBON DIOXIDE
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ELECTRON ATTACHMENT
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OXIDES
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