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Mechanism of thermal electron attachment to O/sub 2/ as studied by observing isotope effects of attachment rates for /sup 18/O/sub 2/ systems

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:6523847
Thermal electron attachment in pure /sup 18/O/sub 2/ and its mixtures with H/sub 2/, D/sub 2/, N/sub 2/, and CO/sub 2/ has been studied at room temperature. The three-body attachment rate constants for pure /sup 18/O/sub 2/, and its H/sub 2/, D/sub 2/, and CO/sub 2/ mixtures are twice or more greater than those for the corresponding /sup 16/O/sub 2/ systems, but slightly smaller than those expected from the Bloch--Bradbury mechanism. Analyses of the results suggest that the attachment in those systems mostly follow the Bloch--Bradbury mechanism but involve a partial contribution of the attachment to van der Waals molecules containing oxygen. The result for the /sup 18/O/sub 2/--N/sub 2/ mixture, in which the three-body rate constant increases only by a factor of 1.3 compared to that for the /sup 16/O/sub 2/--N/sub 2/ mixture, strongly suggests a significant role of the attachment to van der Waals molecule (O/sub 2/xN/sub 2/) in this case. The difference in the rate constant between the H/sub 2/ and D/sub 2/ mixtures may primarily be interpreted in terms of the difference in the collisional-stabilization probability between O/sup -//sub 2/*-H/sub 2/ and O/sup -//sub 2/*-D/sub 2/ collisions.
Research Organization:
Fukui Institute of Technology, Fukui 910, Japan
OSTI ID:
6523847
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 78:3; ISSN JCPSA
Country of Publication:
United States
Language:
English