Effect of van der Waals molecules on thermal electron attachment in some O/sub 2/--hydrocarbon mixtures

Journal Article · Sun Dec 14 23:00:00 EST 1980 · J. Chem. Phys.; (United States)

OSTI ID:6742536

Kokaku, Y; Toriumi, M; Hatano, Y

Thermal electron attachment in O/sub 2/--M(M; C/sub 2/H/sub 6/, C/sub 3/H/sub 8/ and n-C/sub 4/H/sub 10/) mixtures has been investigated using a microwave conductivity technique combined with x-ray pulse radiolysis. Evidence is presented for predominant electron attachment to van der Waals molecules (O/sub 2/xM) at higher pressures. The rate constant of electron attachment to (O/sub 2/xM) is much larger than that to O/sub 2/ itself. A discrepancy between our previous results at lower pressures and swarm experiment results at higher pressures is explained quantitatively by the van der Waals molecule mechanism.

• Research Organization: Department of Chemistry, Tokyo Institute of Technology, Meguro-ku, Tokyo 152, Japan
• OSTI ID: 6742536
• Journal Information: J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 73:12; ISSN JCPSA
• Country of Publication: United States
• Language: English

Related Subjects

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
400600* -- Radiation Chemistry
ALKANES
BINARY MIXTURES
CHEMICAL RADIATION EFFECTS
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISTRY
DECOMPOSITION
DISPERSIONS
ELECTRON ATTACHMENT
ELEMENTS
HYDROCARBONS
KINETICS
MIXTURES
NONMETALS
ORGANIC COMPOUNDS
OXYGEN
RADIATION CHEMISTRY
RADIATION EFFECTS
RADIOLYSIS
REACTION KINETICS
VAN DER WAALS FORCES