Thermal electron attachment to NO. II. Temperature dependence and implication of the attachment to van der Waals molecules

Journal Article · Sun Jan 01 04:00:00 EST 1989 · J. Chem. Phys.; (United States)

DOI:https://doi.org/10.1063/1.456524· OSTI ID:6613431

Shimamori, H; Nakatani, Y; Hotta, H

Thermal electron attachment in pure NO, NO--Ar, and NO--(n-C/sub 4/ H/sub 10/ ) mixtures has been studied by using a microwave conductivity technique with pulse radiolysis at temperatures between 250 and 350 K. The three-body attachment rate constants for NO and n-C/sub 4/ H/sub 10/ as the third bodies have negative activation energies, -0.035 and -0.038 eV, respectively. The results are well explained by assuming that the initial three-body electron attachment is associated with dimers or van der Waals molecules.

• Research Organization: Fukui Institute of Technology, 3-6-1 Gakuen, Fukui 910, Japan
• OSTI ID: 6613431
• Journal Information: J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 90:1; ISSN JCPSA
• Country of Publication: United States
• Language: English

Related Subjects

38 RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY
400600* -- Radiation Chemistry
ALKANES
ARGON
CHALCOGENIDES
CHEMICAL RADIATION EFFECTS
CHEMICAL REACTIONS
CHEMISTRY
DECOMPOSITION
DISPERSIONS
ELECTROMAGNETIC RADIATION
ELECTRON ATTACHMENT
ELEMENTS
FLUIDS
GASES
HYDROCARBONS
IONIZING RADIATIONS
MIXTURES
NITRIC OXIDE
NITROGEN COMPOUNDS
NITROGEN OXIDES
NONMETALS
ORGANIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
RADIATION CHEMISTRY
RADIATION EFFECTS
RADIATIONS
RADIOLYSIS
RARE GASES
TEMPERATURE DEPENDENCE
X RADIATION