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Title: Organometallic vapor phase epitaxy of high-performance strained-layer InGaAs-AlGaAs diode lasers

Journal Article · · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/3.81377· OSTI ID:5705465
;  [1]
  1. Massachusetts Inst. of Tech., Lexington, MA (United States). Lincoln Lab.

This paper reports on graded-index separate-confinement heterostructure single-quantum-well lasers incorporating a strained In{sub x}Ga{sub 1{minus}x}As active layer, with x {le} 0.25, and AlGaAs confining layers that have been grown on GaAs substrates by low-pressure organometallic vapor phase epitaxy. The emission wavelength increases from 0.85 {mu}m for x = 0 to 1.03 {mu}m for x = 0.25. The growth of GaAs layers bounding the InGaAs active layer significantly improves laser performance. For devices with x = 0.25 and a cavity length L of 500 {mu}m, the pulsed threshold current density J{sub th} is reduced form 550 A/cm{sup 2} for structures with 10-nm-thick bounding layers, while the differential quantum efficiency {eta}{sub d} is increased from 46 to 80%. For x = 0.25 and L = 1500 {mu}m, J{sub th} = 65 A/cm{sup 2}. Output powers as high as 1.6 W per facet and power conversion efficiencies as high as 47% have been obtained for continuous operation of lasers with x = 0.25 having uncoated facets.

OSTI ID:
5705465
Journal Information:
IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States), Vol. 27:3; ISSN 0018-9197
Country of Publication:
United States
Language:
English