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Process-induced defects in solar cell silicon

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.335716· OSTI ID:5701706
The microstructure of as-grown and processed, edge-defined film-fed grown, silicon ribbons was studied in order to identify the basic mechanisms responsible for the change of the as-grown defect structure during processing at elevated temperatures. The short heat treatment required to diffuse the p-n junction was sufficient to cause heterogeneous precipitation of impurity atoms, particularly transition metals. In addition, an elastic recovery of the ribbon occurred by dislocation glide, resulting in the formation of a polygonizationlike structure of sub boundaries in the base. Mechanism are suggested by which twin boundaries, acting as dislocation obstacles, can concentrate the relatively low average dislocation densities typical of edge-defined film-fed grown ribbons (10/sup 4/ cm/sup -2/ to 10/sup 8/ cm/sup -2/) to values which are sufficient to induce the formation of subgrainlike boundary structures.
Research Organization:
Department of Materials Science and Engineering, Bard Hall, Cornell University, Ithaca, New York 14853
DOE Contract Number:
AC02-76ER02899
OSTI ID:
5701706
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 58:1; ISSN JAPIA
Country of Publication:
United States
Language:
English