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U.S. Department of Energy
Office of Scientific and Technical Information

Processed-induced defects in EFG ribbons

Technical Report ·
OSTI ID:5357773
The defect structure of processed edge defined film-fed growth (EFG) silicon ribbons has been studied using a variety of electron microscopic techniques. Comparison between the present results and previous studies on as-grown ribbons has shown that solar cell processing introduces additional defects into the ribbons. The creation of point defects during high temperature phosphorus diffusion induces dislocation climb, resulting in the formation of dislocation helices in the diffused layer. The base regions of the processed ribbons contain low-angle tilt boundaries which are formed during processing. Small precipitates, approx. 20 nm in size, are found at the low-angle boundaries. In addition, larger precipitates, approx. l..mu..m in size, have been identified. Possible formation mechanisms for these precipitates are discussed.
Research Organization:
Jet Propulsion Lab., Pasadena, CA (USA); Cornell Univ., Ithaca, NY (USA). Dept. of Materials Science and Engineering
DOE Contract Number:
NAS-7-100-956046
OSTI ID:
5357773
Report Number(s):
DOE/JPL/956046-4; ON: DE82016641
Country of Publication:
United States
Language:
English