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HgCdTe surface and defect study program. Final report, 1 July 1985-2 March 1986

Technical Report ·
OSTI ID:5698739
Enhanced doping density within 250A of the passivated interface of Hg(0.7)Cd(0.3)Te (PHO-TOX-SiO/sub 2/ and anodic oxide) were measured using capacitance-voltage techniques. Detailed doping profiles in channeled implants in Hg(0.7)Cd(0.3)Te show that nuclear damage is the dominant mechanism causing damage-induced donor levels with profiles similar to those expected for unoriented implants. Implant atomic profiles are presented for a variety of ions. The role of the weak Hg bond is discussed in forming interfaces with Ag, Cu and A1. CdTe band structure is calculated using a nonlocal pseuo-potential and the results are used to interpret angle-resolved photoemission spectroscopy results on HgCdTe. Dislocation energies and hardnesses are calculated by an extension of Harrison's model as are bond length and bond energy changes. Bond-length relaxation in pseudo-binary alloys is applied to the case of tetrahedral structures and compared to Ga(l-x)In(x)As. Anomalous behavior of Si 2p core-exciton binding energy and line width is explained in SixGe1-x alloys. Finally, correlations between Cd and Zn in Cd(1-x)Zn(x)Te and Hg and Zn in Hg(1-x)Zn(x)Te are calculated.
Research Organization:
Santa Barbara Research Center, Goleta, CA (USA)
OSTI ID:
5698739
Report Number(s):
AD-A-166795/5/XAB
Country of Publication:
United States
Language:
English