A numerical model of the flow and heat transfer in a rotating disk chemical vapor deposition reactor
Steady, laminar, axisymmetric and circumferentially uniform flow and heat transfer, including the effects of variable properties and buoyancy, have been modeled within a rotating disk chemical vapor deposition (CVD) reactor. The reactor is oriented vertically, with the hot, isothermal, spinning disk facing upward. The Navier-Stokes and energy equations have been solved for the carrier gas helium, at atmospheric pressure. The solutions have been obtained over a range of parameters which is of importance in CVD applications. The primary parameters are the ratio of the disk temperature to the free stream temperature T/sub ..omega..//T/sub infinity/, the disk Reynolds number Re = r/sub d//sup 2/..omega../..nu../sub infinity/, a mixed convection parameter Gr/Re/sup 3/2/ = g(1 - rho/sub ..omega..//rho/sub infinity/)/(..omega sqrt omega nu../sub infinity/), the dimensionless inlet velocity u/sub infinity//..sqrt omega nu../sub infinity/, and two geometric parameters r/sub 0//r/sub d/ and L/r/sub d/. Results are obtained for the velocity and the temperature fields and for the heat flux at the surface of the rotating disk. Comparisons are made with the one-dimensional, variable properties (excluding buoyant effects), infinite rotating disk solutions of Pollard and Newman. Results are presented in terms of a local Nusselt number. The potential uniformity of CVD in this geometry can be inferred from the variation of the Nusselt number over the surface of the rotating disk. The effects of buoyancy and the finite size of the rotating disk within the cylindrical reactor evident.
- Research Organization:
- Sandia National Labs., Livermore, CA (USA); California Univ., Berkeley (USA). Dept. of Mechanical Engineering
- DOE Contract Number:
- AC04-76DR00789
- OSTI ID:
- 5683970
- Report Number(s):
- SAND-86-8843; ON: DE88005179
- Resource Relation:
- Other Information: Portions of this document are illegible in microfiche products
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHEMICAL VAPOR DEPOSITION
CHEMICAL REACTORS
EQUATIONS
FLUID FLOW
HEAT FLUX
HEAT TRANSFER
MICROELECTRONIC CIRCUITS
NAVIER-STOKES EQUATIONS
NUSSELT NUMBER
ROTATION
CHEMICAL COATING
DEPOSITION
DIFFERENTIAL EQUATIONS
ELECTRONIC CIRCUITS
ENERGY TRANSFER
MOTION
PARTIAL DIFFERENTIAL EQUATIONS
SURFACE COATING
360000* - Materials