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Displacement damage effects in SiC JFETs as a function of temperture

Conference · · AIP Conference Proceedings (American Institute of Physics); (United States)
OSTI ID:5649162
 [1];  [2]; ;  [1]
  1. US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783 (United States)
  2. BoozAllen Hamilton, Inc., 891 Elkridge Landing Road, Linthicum, Maryland 21090 (United States)
A study of neutron-induced displacement damage effects as a function of temperature is reported for [ital n]-channel, 2-[mu]m channel length, depletion mode junction-field-effect-transistor (JFETs) fabricated on 6H-silicon carbide (SiC). Very little effect on the electrical characteristics of the devices was observed for neutron fluences less than 10[sup 15] n/cm[sup 2] and the effect for fluences greater than 10[sup 15] n/cm[sup 2] became less significant with increasing temperature. The results offer promise for SiC devices to be used in applications which combine high-temperature and radiation environments, where Si and GaAs technologies are limited.
OSTI ID:
5649162
Report Number(s):
CONF-930103--
Conference Information:
Journal Name: AIP Conference Proceedings (American Institute of Physics); (United States) Journal Volume: 271:2
Country of Publication:
United States
Language:
English